2018
Last Position : Research Assistant
Period :
November 2018 to
Present
Job Description :
The details about my job , I have been studying about Thinfilm and doing thesis in the same time , Preparation and Characterization of Nanostructured CrAlN Thin Films Deposited by Reactive DC Magnetron Sputtering Method From Alloy Target ,In this research work, chromium aluminium nitride CrAlN thin films have been deposited on silicon wafers by reactive DC magnetron sputtering method from alloy target without substrate heating and biasing voltage. The flow rates of nitrogen gas during the deposition process were varied in the range of 2 to 10 sccm for investigating of the effect of the nitrogen gas flow rate on the structure of the as-deposited films. and varied current to CrAl alloy target in the range of 300 500 and700 mA. The crystal structure, thickness, microstructure, and elemental composition were characterized by X-ray diffraction XRD, Field Emission Scanning Electron Microscopy FE-SEM, and Energy Dispersive X-ray Spectroscopy EDS, respectively. Besides, I have also been teaching Physical laboratories to students of Faculty of Engineer, Nurse, Physician , Medical technology, Phamacy and Science.